Germanium MOS capacitors with ultra thin HfO2 gate dielectric
- Year
- 2003
- Author
- Q. C. Zhang, C. Zu, N. Wu, A. Chin, M. F. Li, B. J. Cho, L. K. Bera, and D. L. Kwong,
- Conference
- 2nd International Conference on Materials for Advanced Technologies,
Q. C. Zhang, C. Zu, N. Wu, A. Chin, M. F. Li, B. J. Cho, L. K. Bera, and D. L. Kwong,"Germanium MOS capacitors with ultra thin HfO2 gate dielectric", 2nd International Conference on Materials for Advanced Technologies, p. 513, MRS Singapore, December 2003.
December 2003.
MRS Singapore