Analysis of charge trapping and breakdown mechanism in high-K dielectrics with metal gate electrode using carrier separation
- Year
- 2003
- Author
- W. Y. Loh, B. J. Cho, M. S. Joo, M. F. Li, D. S. H. Chan, D. L. Kwong
- Conference
- International Electron Device Meeting (IEDM)
W. Y. Loh, B. J. Cho, M. S. Joo, M. F. Li, D. S. H. Chan, D. L. Kwong, "Analysis of charge trapping and breakdown mechanism in high-K dielectrics with metal gate electrode using carrier separation," International Electron Device Meeting (IEDM), Dec., 2003, Washington, USA.
Dec., 2003
Washington, USA