Effect of electron-beam lithography on thin gate oxide reliability
- Year
- 2001
- Author
- P. F. Chong, B. J. Cho, E. F. Chor, and M. S. Joo
- Conference
- 8th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA)
P. F. Chong, B. J. Cho, E. F. Chor, and M. S. Joo, "Effect of electron-beam lithography on thin gate oxide reliability", Proc. of the 8th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), p. 55, IEEE, Singapore, July 2001.
July 2001.
Singapore