Predicting plasma charging damage in ultra thin gate oxide by using nondestructive DCIV technique
- Year
- 1999
- Author
- H. Guan, M. F. Li, Y. Zhang, B. J. Cho, B. B. Jie, J. Xie, J. L. F. Wang, A. C. Yen, G. T. T. Sheng, Z. Dong, and W. Li
- Conference
- 1999 IEEE International Integrated Reliability Workshop (IRW) Final Report
H. Guan, M. F. Li, Y. Zhang, B. J. Cho, B. B. Jie, J. Xie, J. L. F. Wang, A. C. Yen, G. T. T. Sheng, Z. Dong, and W. Li, "Predicting plasma charging damage in ultra thin gate oxide by using nondestructive DCIV technique", 1999 IEEE International Integrated Reliability Workshop (IRW) Final Report, pp. 20, Lake Tahoe, CA, USA, Oct. 1999.
Oct. 1999.
Lake Tahoe, CA, USA