Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structure
- Year
- 1999
- Author
- J. M. P. Yue, W. K. Chim, B. J. Cho, W. H. Qin, D. S. H. Chan, Y. B. Kim, S. A. Jang, and I. S. Yeo,
- Conference
- 7th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp. 94, IEEE
J. M. P. Yue, W. K. Chim, B. J. Cho, W. H. Qin, D. S. H. Chan, Y. B. Kim, S. A. Jang, and I. S. Yeo, "Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structure", Proc. of the 7th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp. 94, IEEE, Singapore, July 1999.
July 1999.
Singapore