Radiation -induced leakage current of ultra-thin gate oxide under X-ray lithography condictions
- Year
- 1999
- Author
- B. J. Cho, S. J. Kim, C. H. Ling, M. S. Joo, and I. S. Yeo
- Conference
- 7th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA)
B. J. Cho, S. J. Kim, C. H. Ling, M. S. Joo, and I. S. Yeo, "Radiation -induced leakage current of ultra-thin gate oxide under X-ray lithography condictions", Proc. of the 7th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp. 30, IEEE, Singapore, July 1999.
July 1999.
Singapore