Annealing behavior of a double MeV implanted silicon
- Year
- 1997
- Author
- N. H. Cho, T. H. Huh, Y. T. Jang, J. S. Ro, K. H. Lee, B. J. Cho, and J. C. Kim,
- Conference
- Proc. of the 11th International Conf. on Ion Implantation Technology,
N. H. Cho, T. H. Huh, Y. T. Jang, J. S. Ro, K. H. Lee, B. J. Cho, and J. C. Kim, "Annealing behavior of a double MeV implanted silicon", Proc. of the 11th International Conf. on Ion Implantation Technology, pp. 661, IEEE, Austin, USA, May 1997.
May 1997.
Austin, USA