Effect of Ti deposition temperature on TiSi2 orientation and its thermal instability in heavility doped Si
- Year
- 1996
- Author
- B. H. Park, S. H. Yu, B. J. Cho, and J. C. Kim
- Conference
- Proc. of 1996 Spring Meeting of Materials Research Society of Korea
B. H. Park, S. H. Yu, B. J. Cho, and J. C. Kim, "Effect of Ti deposition temperature on TiSi2 orientation and its thermal instability in heavility doped Si", Proc. of 1996 Spring Meeting of Materials Research Society of Korea, pp. 61, MRS of Korea, Taegu, Korea, May 1996.
May 1996.
Taegu, Korea