Effect of additional low temperature RTA on ultra-shallow p+-n junction formation
- Year
- 1997
- Author
- K. H. Lee, J. G. Oh, B. J. Cho, and J. C. Kim
- Conference
- 11th International Conf. on Ion Implantation Technology
K. H. Lee, J. G. Oh, B. J. Cho, and J. C. Kim, "Effect of additional low temperature RTA on ultra-shallow p+-n junction formation", Proc. of the 11th International Conf. on Ion Implantation Technology, pp. 634, IEEE, Austin, USA, May 1997. (Best paper award)
May 1997
Austin, USA,