Integrity of gate oxides irradiated under electron-beam lithography conditions
- Year
- 1999
- Author
- P. F. Chong, B. J. Cho, E. F. Chor, M. S. Joo, and I. S. Yeo
- Conference
- 1999 International Conf. on Solid State Devices and Materials (SSDM)
P. F. Chong, B. J. Cho, E. F. Chor, M. S. Joo, and I. S. Yeo, "Integrity of gate oxides irradiated under electron-beam lithography conditions", Extended Abstract of the 1999 International Conf. on Solid State Devices and Materials (SSDM), pp. 182, The Japan Society of Applied Physics, Tokyo, Japan, Sep. 1999.
Sep. 1999.
Tokyo, Japan