Effects of Post-Decoupled-Plasma-Nitridation Annealing of Ultra-Thin Gate Oxide
- Year
- 2002
- Author
- C. M. Lek , B. J. Cho, W. Y. Loh, C. H. Ang, W. Lin, Y. L. Tan, J. Z. Zhen, J. Tan, T. P. Chen
- Conference
- Proc. of 9th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA)
C. M. Lek , B. J. Cho, W. Y. Loh, C. H. Ang, W. Lin, Y. L. Tan, J. Z. Zhen, J. Tan, T. P. Chen, "Effects of Post-Decoupled-Plasma-Nitridation Annealing of Ultra-Thin Gate Oxide", Proc. of 9th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp. 232, Singapore, July 2002.
July 2002.
Singapore