Characterization of Ultrathin Plasma Nitrided Gate Dielectrics in PMOSFET for 0.18μm Technology and Beyond
- Year
- 2002
- Author
- S. S. Tan, C. H. Ang, C. M. Lek, T. Chen, B. J. Cho, A. See and L. Chan
- Conference
- 9th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA)
S. S. Tan, C. H. Ang, C. M. Lek, T. Chen, B. J. Cho, A. See and L. Chan, "Characterization of Ultrathin Plasma Nitrided Gate Dielectrics in PMOSFET for 0.18μm Technology and Beyond", Proc. of 9th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp. 254, Singapore, July 2002.
July 2002.
Singapore