Behavior of Effective Work Function in Metal/High-K Gate Stack under High Temperature ProcessI
- Year
- 2004
- Author
- M. S. Joo, B. J. Cho, D. Z. Chi, N. Balasubramanian, and D. L. Kwong,
- Conference
- International Conf. on Solid State Devices and Materials (SSDM), The Japan Society of Applied Physics
M. S. Joo, B. J. Cho, D. Z. Chi, N. Balasubramanian, and D. L. Kwong, "Behavior of Effective Work Function in Metal/High-K Gate Stack under High Temperature Process", International Conf. on Solid State Devices and Materials (SSDM), The Japan Society of Applied Physics, Japan, Sept. 2004.
Sept. 2004.
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