Dual Metal Gate Process by Metal Substitution of Dopant-Free Polysilicon on High-K Dielectric
- Year
- 2005
- Author
- C. S. Park, B. J. Cho, W. S. Hwang, W. Y. Loh, L. J. Tang, and D. L. Kwong,
- Conference
- 2005 Symposium on VLSI Technology
C. S. Park, B. J. Cho, W. S. Hwang, W. Y. Loh, L. J. Tang, and D. L. Kwong, "Dual Metal Gate Process by Metal Substitution of Dopant-Free Polysilicon on High-K Dielectric", 2005 Symposium on VLSI Technology, pp. 48-49, Kyoto, Japan, June 2005.
June 2005.
Kyoto, Japan