Integration of Dual Metal Gate/High-K dielectric Stacks for Fermi-Level Pinning Free
- Year
- 2005
- Author
- B. J. Cho
- Conference
- The 2nd International Workshop on Nanoscale Semiconductor Devices
B. J. Cho, "Integration of Dual Metal Gate/High-K dielectric Stacks for Fermi-Level Pinning Free", The 2nd International Workshop on Nanoscale Semiconductor Devices, p. 253-279, Daegu, Korea, June 2005. (Invited).
June 2005
Daegu, Korea,