Evaluation of SOHOS (polysilicon-oxide-high-K-oxide-silicon) structure for Flash memory device application
- Year
- 2005
- Author
- Y. N. Tan, B. J. Cho, W. K. Chim, W. K. Choi, M. S. Joo, and T. H. Ng,
- Conference
- 3rd International Conference on Materials for Advanced Technologies, Symposium G
Y. N. Tan, B. J. Cho, W. K. Chim, W. K. Choi, M. S. Joo, and T. H. Ng, "Evaluation of SOHOS (polysilicon-oxide-high-K-oxide-silicon) structure for Flash memory device application", 3rd International Conference on Materials for Advanced Technologies, Symposium G: Nanodevices and Nanofabrication, p. 19-20, MRS Singapore, July 2005.
July 2005.
MRS Singapore,