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Total 6건 1 페이지

2006
6

"Demonstration of Low Vt NMOSFETs Using Thin HfLaO in ALD TiN/HfSiO Gate Stack" C. S. Park, S. C. Song, G. Bersuker, H. N. Alshareef, B. S. Ju, P. Majhi, B. H. Lee, R. Jammy, H. K. Park, M. S. Joo, J. Pu, and B. J. Cho, 2006 International Conference on Solid State Devices and Materials (SSDM 2006), 2006
5

"Effects of Low Energy Nitrogen Plasma on the Removal of HfSiON" W. S. Hwang, W. J. Yoo, B. J. Cho, and D. S. H. Chan, AVS 53rd International Symposium, 2006
4

"Study on nonvolatile byproducts generated during etching of advanced gate stacks" W. S. Hwang, B. J. Cho, D. S. H. Chan, and W. J. Yoo,, 28th International Symposium on Dry Process,, 2006
3

"Damage free etching of RuO2 in O2/He plasma," W. S. Hwang, V. N. Bliznetsov, B. J. Cho, D. S. H. Chan, and W. J. Yoo,, 28th International Symposium on Dry Process, 2006
2

"Application of High-ĸ dielectrics to MIM capacitors for RF/analog CMOS Devices" B. J. Cho and S. J. Kim,, SEMICON Korea 2006 SEMI Technology Symposium,, 2006
1

"Integration of high-K gate dielectric into high mobility substrate" B. J. Cho,, 2006 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES SCIENCE AND TECHNOLOGY, 2006

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