Study on nonvolatile byproducts generated during etching of advanced gate stacks
- Year
- 2006
- Author
- W. S. Hwang, B. J. Cho, D. S. H. Chan, and W. J. Yoo,
- Conference
- 28th International Symposium on Dry Process,
W. S. Hwang, B. J. Cho, D. S. H. Chan, and W. J. Yoo, "Study on nonvolatile byproducts generated during etching of advanced gate stacks", 28th International Symposium on Dry Process, Nagoya, Japan, November 2006.
November 2006.
Nagoya, Japan