Dramatic Improvement of high-K Gate Dielectric Reliability by Replacing Metal Gate Electrode with Mono-Layer Graphene
- Year
- 2012
- Author
- Jong Kyung Park, Seung Min Song, Jeong Hun Mun, and Byung Jin Cho
- Conference
- 2012 Symposium on VLSI Technology
Jong Kyung Park, Seung Min Song, Jeong Hun Mun, and Byung Jin Cho, "Dramatic Improvement of high-K Gate Dielectric Reliability by Replacing Metal Gate Electrode with Mono-Layer Graphene", 2012 Symposium on VLSI Technology, Hawaii, USA, June 12-15, 2012.
June 12-15, 2012.
Hawaii, USA