Dramatic Increase of Dielectric Constant of Al2O3 by Very Light Doping of La and Thermal Treatment and Its Application to Flash Memory Device
- Year
- 2012
- Author
- Jong Kyung Park, Seok-Hee Lee, Ki-Hong Lee, Seung Ho Pyi, and Byung Jin Cho
- Conference
- 19th Korean Conference on Semiconductors
Jong Kyung Park, Seok-Hee Lee, Ki-Hong Lee, Seung Ho Pyi, and Byung Jin Cho, "Dramatic Increase of Dielectric Constant of Al2O3 by Very Light Doping of La and Thermal Treatment and Its Application to Flash Memory Device", 19th Korean Conference on Semiconductors, Seoul, Korea, Feb. 2012.
Feb. 2012.
Seoul, Korea