Effect of Reduced Graphene Oxide Cap Layer on Electromigration Reliability of Cu Interconnect
- Year
- 2014
- Author
- Seong Jun Yoon, Sung-Yool Choi and Byung Jin Cho
- Conference
- Graphene 2014
Seong Jun Yoon, Sung-Yool Choi and Byung Jin Cho, "Effect of Reduced Graphene Oxide Cap Layer on Electromigration Reliability of Cu Interconnect", Graphene 2014, Toulouse, France, May 6-9, 2014.
May 6-9, 2014.
Toulouse, France