Selective Pore-Sealing of Highly Porous Ultralow-k dielectrics for ULSI Interconnects by Cyclic Initiated Chemical Vapor Deposition Process
- Year
- 2018
- Author
- Seong Jun Yoon, Kwanyong Pak, Hyun Jun Ahn, Alexander Yoon, Sung Gap Im, and Byung Jin Cho
- Conference
- 2018 Symposium on VLSI Technology
- File
- PUB2.png (1.2M) 0회 다운로드 DATE : 2020-02-27 15:16:01
Seong Jun Yoon, Kwanyong Pak, Hyun Jun Ahn, Alexander Yoon, Sung Gap Im, and Byung Jin Cho, "Selective Pore-Sealing of Highly Porous Ultralow-k dielectrics for ULSI Interconnects by Cyclic Initiated Chemical Vapor Deposition Process", 2018 Symposium on VLSI Technology, Hawaii, USA, June 18-22, 2018.
June 18-22, 2018.
Hawaii, USA