Method of fabricating a CMOS device with dual metal gate electrodes
- Inventor
- C. S.Park, B.J.Cho, N. Balasubramanian
- No.
- 7,316,950
- 출원국가
- 국외
- Date
- 2008
Method of fabricating a CMOS device with dual metal gate electrodes
Patents
- Home
- Publication
- Patents
Method of fabricating a CMOS device with dual metal gate electrodes