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initiated chemical vapor deposition apparatus
Inventor
CHO, Byung Jin, KIM, Min Ju, JUNG, Jae Joong, PARK, Hyung Sang, TAK, Young Duck, KIM, Ji Hye
No.
10-2020-0079231
출원국가
국내
Date
2020
Date
Jun. 2020.

CHO, Byung Jin, KIM, Min Ju, JUNG, Jae Joong, PARK, Hyung Sang, TAK, Young Duck, KIM, Ji Hye, initiated chemical vapor deposition apparatus, Korea Patent, 10-2020-0079231, Jun. 2020.