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Equipment: High-power DC magnetron sputter

Model: ITS-MS-4-2 (I.T.S)

 

 

Application:

Metal & Dielectric Deposition by sputtering

Pre-Cleaning (Surface treatment) by RF gun

 

General Information:

- High power multi-target sputtering system ; Nickel, etc.

- Non-toxic gas line with MFC (Ar, O2, N2)

- DC gun power (for target sputtering) ; 3kW

- RF gun power (for Ar+ ion bombardment surface-cleaning) ; 300W

- Deposition rate (Nickel) ; 50nm/min