Furnace
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작성자 JIT
댓글 0건 조회 554회 작성일 2018-04-12 15:54
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Equipment : Horizontal Furnace
Model : SJF-2000-T3
Application:
Annealing for semiconductor fabrication
-Si oxidation, High temperature annealing, Forming gas annealing, etc
General information
-Wafer size : 4 inch, 8 inch
-Max 3 tubes
-Temp Range : 400°C ~ 1100°C
-Temperature accuracy : ±1°C
-Fully automatic computer control
-Loading speed : 10~600 mm/min
-Capacity : 25 wafers
- 이전글Metal ALD 18.04.12
- 다음글Sputtering System 19.03.05
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